Applied ICP-OES interferences

Duration: 1 day for live courses
Experience level: Advanced
Delivery methods: Face-to-face | Offsite training & consultancy | Online | Onsite training & consultancy |
Type of course: Universal
Applicable to manufacturer(s):
CPD Approved: Not yet approved
Scheduled course price: £485.00 + TAX per delegate
Course discounts: RSC HEaTED Cambridge Network CAMS members receive a discount on this course

Your in-depth guide to inductively coupled plasma optical emission spectroscopy (ICP-OES) interferences

This 1-day, classroom-based course offers an in-depth exploration of inductively coupled plasma optical emission spectroscopy (ICP-OES) interferences, designed for those with basic to advanced knowledge of elemental analysis.

This analytical chemistry training course focuses on identifying and overcoming spectral and non-spectral interferences in ICP-OES, including line overlaps, background emission effects, matrix suppression/enhancement, and physical transport phenomena.

The course covers the principles and chemistry behind ICP-OES, going beyond instrumentation fundamentals to explore how different techniques and mitigation strategies can be applied within an ICP-OES workflow to reduce interferences. You will reinforce your understanding by applying your knowledge to real-life case studies involving ICP-OES data and interference challenges. Improve understanding further with the opportunity to handle and see (virtual courses) instrument parts such as an ICP torch, spray chamber and nebuliser.

Why should I join?

You will have a deeper understanding of what causes interferences in ICP-OES, how to identify them in spectral data, and the techniques available to minimize their impact during analysis and sample preparation.

This course provides you with:

A strong understanding of ICP-OES interferences and their different types
Clear explanations of ICP-OES instrumentation and key components
Understanding of spectral and non-spectral interferences and their origins
Confidence to interpret emission spectra and recognise interference patterns
A solid progression from basic knowledge to practical analytical depth
An excellent refresher if you have not used ICP-OES recently

This is your opportunity to enhance your ICP-OES expertise and gain insight into the causes of analytical inaccuracies in your data.

What would I learn?

This advanced course focuses on the theory of ICP-OES, particularly how plasma conditions and sample composition contribute to interferences during measurement. You will learn:

The fundamental principles of inductively coupled plasma and optical emission spectrometry
Different types of interference reduction and correction strategies
Where interferences occur within the ICP-OES system (plasma, optics, detector)
The impact of spectral overlaps and background emission on accuracy
The use of background correction techniques such as off-peak correction and multi-point correction
The influence of matrix effects on emission intensity
The role of sample preparation techniques in ICP-OES
Line selection strategies to minimise spectral interference
Considering interferences during method development and validation
Applying your understanding to real-world ICP-OES datasets, including environmental and industrial samples
The role of maintenance and troubleshooting, and how these can aid in reducing interferences during analysis

What knowledge will I gain?

By the end of the course, you will:

Understand the principles of ICP-OES and why interferences occur
Gain insight into spectral interferences (line overlap, molecular bands) and non-spectral interferences (matrix and physical effects)
Understand how method parameters can influence emission signals
Interpret ICP-OES data and distinguish between true signals and interference artefacts
Comprehend the various background correction techniques used in ICP-OES
How matrix matching and internal standards can be used for correcting interferences in analysis
Where dilution and sample preparation strategies can and aid in reducing interferences

Is this course for me?

This ICP-OES training course is designed for anyone seeking a deeper understanding of ICP-OES, including:

Laboratory analysts and technicians working with elemental analysis using ICP-OES
Laboratory or line managers responsible for ICP-OES operations and workflows
Data analysts and report writers interpreting ICP-OES spectra and results
Service engineers seeking a more detailed understanding of ICP-OES systems
Sales, commercial, or marketing professionals working with ICP-OES instrumentation or services

If ICP-OES is relevant to your work in any capacity, this applied course, delivered by experts in the field will provide you with a practical understanding of ICP-OES interferences.